Plasma coating or plasma enhanced chemical vapor deposition (PECVD) is an application using plasma in order to modify the properties of materials to produce a coating on a surface. Ultra-thin layers of different molecular groups or monomers are applied on objects and surfaces. With the help of this plasma coating process, surfaces can be made hydrophobic or hydrophilic, scratch resistant, corrosion protected or functionalized to enable bonding. Another modern form of plasm coating is the so-called plasma spray deposition technology. In contrast to PECVD, where surface temperatures on the substrate are normally close to room temperature, plasma spraying operates with a high-velocity, high-temperature thermal plasma that has temperatures of up to 10,000 K. Thus, the coating material is quickly molten and accelerated towards the work piece, where it forms rather thick layered depositions.
For coating with low-pressure plasma, a gas or liquid monomer vapor is introduced into the plasma chamber. This process gas or vapor is molecularly bonded with the aid of the plasma. This coating is deposited in the range of 10s of angstroms to microns depending on the process parameters.
For coating with an atmospheric plasma process, the gaseous monomers are introduced directly into the plasma jet by means of a carrier gas. Thus, the plasma focusses the monomer on the surface and polymerises it. A special variety of plasma jets is the thermal spray technology, which is often used for metal or ceramic coatings. These depositions are important for heat or wear resistant materials.
Both, high and low temperature plasma coating techniques can be applied with non-thermal or thermal plasmas, depending on the coating material, the desired thickness and, of course, the heat resistance of the substrate. With different plasma coating methods nearly all industrially relevant coatings can be obtained.
The process of producing a plasma-enhanced chemical vapor deposition coating using HMDSO as a feedstock can produce a hydrophobic coating. This process of producing a hydrophobic coating or a polymer like coating using HMDSO is possible by limiting or eliminating the amount of oxygen used in the process gases at the time of deposition. The absence of oxygen in the process produces a coating with a polymer like performance. Adding oxygen to the process in higher concentrations produces a hydrophilic coating higher in oxide concentration. As the process gas concentration increases in oxygen concentration, the deposition produced becomes less organic and higher in silicon oxide concentration.
The process of producing a plasma-enhanced chemical vapor deposition coating using fluorine monomer gases as a feedstock can produce a PTFE-like hydrophobic coating. There are many fluorine-containing monomer gases optimized for plasma feedstocks. These optimizations in coating performance can vary widely based on the application or industry requirements. Examples of some of the optimizations would include contact angle, mechanical wear performance, electrical conductivity, thermal conductivity, biocompatibility, water-resistance, or chemical resistance.
The process of producing a plasma-enhanced chemical vapor deposition coating using the unstable monomer vinyl acetate gas as a feedstock can produce a polyvinyl acetate (PVA) like hydrophilic coating. PVA is used in adhesives, adhesive tape, sausage casings, cheese rinds, and carpet coatings because it is harmless. The process of producing a hydrophobic coating or a polymer like coating using HMDSO is possible by limiting or eliminating the amount of oxygen used in the process gases at the time of deposition. The absence of oxygen in the process produces a coating with polymer-like hydrophobic performance. As the process gas concentration decreases in oxygen concentration, the deposition produced becomes more organic and polymer-like.
The process of producing a plasma-enhanced chemical vapor deposition coating to decrease the coefficient of friction on a surface is possible with plasma processing. This reduction of surface friction can be made with PTFE like, HMDSO and carbon plasma deposited treatments. The process of using carbon as a low friction coating is the lowest cost of these coatings. This simple, low-cost process is often used in coating elastomeric seals and O-rings to produce a condition where these components are easier to handle, and vibratory bowl feed in high volume manufacturing. This method of using dry lubrication on seals also increases wear resistance and minimizes abrasion.
The process equipment used to produce an atmospheric plasma spray coating using a monomer vapor or gas as feedstock to produce a coating or deposition on different substrates is currently available. Atmospheric plasma spray coating equipment is affordable, easy to configure and easy to use. The ability to load monomer or gas feed stock of your choice into the atmospheric plasma source and consistently plasma spray a coating can be performed on a research or manufacturing basis. Good operational equipment efficiency, repeatability and reliability are possible with proven atmospheric plasma deposition tooling today.
Control Cabinet:
W 560 mm H 600 mm D 600 mm
Chamber:
Ø 10.5 in, L 16.5 in
Chamber Volume:
24
Gas Supply:
Mass flow controllers
Generator:
1 pc. with 40 kHz
(optional: 13.56 MHz or 2.45 GHz)
Control:
Touch Screen
Control Cabinet:
W 600 mm H 1700 mm D 800 mm
Chamber:
Ø 10.5 in, L 16.5 in
Chamber Volume:
24
Gas Supply:
Mass flow controllers
Generator:
1 pc. with 40 kHz
(optional: 13.56 MHz or 2.45 GHz)
Control:
PC
Control Cabinet:
W 600 mm H 1700 mm D 800 mm
Chamber Volume:
120
Gas Supply:
Mass flow controllers
Generator:
1 pc. with 40 kHz
(optional: 13.56 MHz or 2.45 GHz)
Control:
PC
Control Cabinet:
W 600 mm H 1700 mm D 800 mm
Gas Supply:
Mass flow controllers
Generator:
1 pc. with 40 kHz
(optional: 13.56 MHz or 2.45 GHz)
Control:
PC
Control Cabinet:
W 870 mm H 1860 mm D 1400 mm
Chamber Volume:
375
Gas Supply:
Mass flow controllers
Generator:
1 pc. with 40 kHz
(optional: 13.56 MHz or 2.45 GHz)
Control:
PC
Control Cabinet:
W 600 mm H 2100 mm D 800 mm
Chamber Volume:
7500
Gas Supply:
Mass flow controllers
Generator:
1 pc. with 40 kHz
(optional: 13.56 MHz or 2.45 GHz)
Control:
PC
Thierry Germany